Session Index

S4. III-N Nanostructures and 2D Materials

S4. III-N Nanostructures and 2D Materials
Monday, Nov. 10, 2025  13:30-14:45
Presider: Prof. Yu-Hsun Chou (National Cheng Kung University, Taiwan) Prof. Jesús Zúñiga Pérez (Nanyang Technological University, Singapore)
Room: 3rd Lecture Room
13:30 - 14:00
Manuscript ID.  0126
Paper No.  2025-Mon-S0407-I001
Invited Speaker:
Dr. Bernard Gil
The Optical Properties of Various Polytypes of sp2-bonded Boron Nitride.

Dr. Bernard Gil, Director of Research, CNRS, UNiversity of Montpellier, France

Hexagonal boron nitride (h-BN), an insulating two-dimensional layered material, has attracted great attention due to its fascinating properties and promising applications across the fields of photonics, quantum optics, and electronics. Given the layered structure of h-BN, various polytypes exist with high-symmetry stacking sequences where successive layers are rotated or translated, leading to a variety of physical properties. Similarly to silicon carbide, polytypism in sp2-bonded boron nitride is to lead to a wealth of variations in the opto-electronic properties. I will report on the optical properties of a variety BN polytypes including bulk crystals grown by precipitation out of molten metallic solutions and epilayers by produced by metal-organic chemical vapor deposition on sapphire substrates [1,2]. The sp2-bonded layered compound BN exists in more than a handful of different polytypes (i.e. different layer stacking sequences) with similar formation energies, which makes obtaining a pure monotype single crystals extremely tricky. Co-existence of polytypes in a similar crystal leads to formation of many interfaces and structural defects having deleterious influence on the internal quantum efficiency of the light- emission and on the mobility of carriers. Light emission, when recorded in standard experimental illumination conditions, is in general inhomogeneous and its yield is dominated to radiative recombination to localized stacking faults [3], even for crystals with state-of-the- art, high structural quality [4]. However, despite of this, lasing operation was reported at 215 nm [5], which has shifted the interest of sp2-bonded BN from the laboratories of basic sciences to the fields of optoelectronic and electrical device applications. Here I present X-ray diffraction, electron microscopy and Raman light scattering experiments that were performed on a large variety of samples grown using the complementary techniques alluded to above and that we interpret with the help of group theory arguments and calculations of the phonon dispersion relations (in the context of quantum espresso). They revealed the three coherently ordered AA’ (normal), AB (Bernal), and ABC or rBN (Rhombohedral) and AA stackings, and the disordered turbostratic (tBN) one. Characterization of the different structural polytypes are completed by micro- photoluminescence experiment measurements that furnish a one-by-one, unambiguous relationship between the sp2-stacking and its photoluminescence spectrum [6,7,8,9]. These, together with reflectance experiment disentangle the nature of the light-matter interaction processes in sp2-bonded BN. All polytypes studied here display an indirect configuration of their fundamental bandgap, some of them (the AA and AB two-layer stackings and the rBN three-layer one) offer efficient Second Harmonic Generation of light performances.
References:
[1] Jiahan Li et al. ACS Nano 15, 7032 (2021).
[2] M. Chubarov et al., Crystal Growth Design 12, 3215 (2012)
[3] R. Bourrellier et al. ACS Photonics 1, 857 (2014).
[4] G. Cassabois et al. Nature Photonics 10, 262, (2016).
[5] K. Watanabe et al. Nature Materials 3, 404 (2004).
[6] M. Rousseau et al. Physical Review Materials 5, 064602 (2021).
[7] M. Moret et al. Applied Physics Letters 119, 262102 (2021).
[8] S.Moon et al. Nature Materials (2025) DOI10.1038/s41563-025-02173-2
[9] W.Desrat et al submitted to Physical Review Materials (under review)


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14:00 - 14:15
Manuscript ID.  0041
Paper No.  2025-Mon-S0407-O001
Julien Brault (Al,Ga)N heterostructures grown on AlN on Graphene: towards van der Waals epitaxy of UV LED structures

Julien Brault, Sunanda Mitra, Sébastien Chenot, Mohamed Al Khalfioui, Université Côte d’Azur, CNRS, CRHEA, Valbonne, 06560, France; Yuma Doko, Graduate School of Engineering, University of Fukui, Bunkyo, Fukui, Japan; Hideaki Kitahara, Masahiko Tani, Akihiro Hashimoto, Research Center for Development of Far Infrared Region, University of Fukui, 3-9-1 Bunkyo Fukui, 910-8507, Japan

A new approach for aluminum gallium nitride (AlGaN) growth is emerging, using materials made of two-dimensional unit layers, such as epitaxial graphene (EG). We present a new approach to the growth of AlGaN on EG on silicon carbide (SiC) substrate. Prior to the fabrication of EG, an ultra-thin AlN layer is deposited on SiC. Annealing the AlN / SiC heterostructure at high temperature leads to the fabrication of an EG layer at the interface, as confirmed by Raman spectroscopy. Next, AlGaN/GaN heterostructures are grown and their structural and optical properties assessed for the fabrication of quantum dot based UV LED.

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14:15 - 14:30
Manuscript ID.  0028
Paper No.  2025-Mon-S0407-O002
Marta Sobanska Peculiarities of MBE Growth and Properties of GaN Nanowires on Metallic ZrN Buffer Layers

Marta Sobanska, Zbigniew R. Zytkiewicz, Karol Olszewski, Aleksandra Wierzbicka, Institute of Physics, Polish Academy of Sciences, Warsaw, Poland; Marek Guziewicz, Łukasiewicz Research Network - Institute for Microelectronics and Photonics, Warsaw, Poland

Plasma-assisted MBE growth of well-oriented device-relevant GaN nanowire arrays on Si or sapphire substrates with metallic ZrN buffer layers is reported. Kelvin probe and TEM measurements show perfect nitrogen-polarity of the nanowires without any sign of mixed polarity commonly observed for self-assembled GaN nanowires on Si. Electrical measurements show a low resistive ohmic electrical contact of ZrN to bottom parts of the nanowires, so the ZrN buffer can play a role of buried electrical contact allowing efficient controlling electrically-driven light emitters based on GaN nanowires. Moreover, a good rectifying characteristic of p-n junction inside a single nanowire was observed.

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14:30 - 14:45
Manuscript ID.  0118
Paper No.  2025-Mon-S0407-O003
Robert Kudrawiec Contactless Electreflectance Studies of Fermi Level
Position at MXene/(Al)GaN Interface – Engineering of
Electric Contacts to (Al)GaN


Robert Kudrawiec, Wroclaw University of Science and Technology

Engineering the Fermi level position on the (Al)GaN surface is very important for
producing electrical contacts to (Al)GaN with desired characteristics, i.e. ohmic or Schottky
contact. In this paper it is shown that such contact engineering can be achieved by simply
depositing MXene on the (Al)GaN surface, and that the Fermi level position at the
MXene/(Al)GaN interface can be investigated using contactless electroreflectance.


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S4. III-N Nanostructures and 2D Materials

Poster Session
Tuesday, Nov. 11, 2025  15:00-17:00
Room: Multifunction Room

Manuscript ID.  0005
Paper No.  2025-Tue-P0401-P001
Kun-Yu Lai The Blood Test for Lung Cancer by InGaN Quantum Wells

Kun-Yu Lai, Thuy Doan Khanh Huynh, Huy Kim Nhat, Fan-Ching Chien, National Central University; Yu‑Chi Chiu, Taoyuan General Hospital; Yu‑Chi Chiu, Yuanpei University of Medical Technology; Pin-Kuei Fu, Taichung Veterans General Hospital; Pin-Kuei Fu, National Chung Hsing University

We propose a blood test for lung cancer by the surface-enhance Raman spectroscopy (SERS) built with InGaN quantum wells. According to the clinical test result with 126 samples, the test accuracy of lung cancer is 99.7 %.

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Manuscript ID.  0097
Paper No.  2025-Tue-P0401-P002
Kun-Yu Lai Growth of Boron Nitride on (100) Silicon Substrates

Chen-Da Du, Kun-Yu Lai, National Central University

Boron nitride (BN) was epitaxially grown on high-resistivity (100) silicon substrates by metal-organic chemical vapor deposition (MOCVD). It is found that a transition from turbostratic BN (tBN) to hexagonal BN (hBN) was formed in the first few atomic layers on the Si substrate. The formation of tBN is believed to relieve the strain between BN and Si.

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Manuscript ID.  0054
Paper No.  2025-Tue-P0401-P003
Chiao-Chih Lin Coupling between WSe2 and Plasmonic Structure

Chiao-Chih Lin, Program on Key Material, Academy of Innovative Semiconductor and Sustainable Manufacturing, National Cheng Kung University, Tainan, Taiwan; Zhe-Wei Hsu, Yu-Hsun Chou, Department of Photonics, National Cheng Kung University, Tainan, Taiwan

This work demonstrates a semiconductor–insulator–metal (SIM) light-emitting device integrating monolayer transition metal dichalcogenides and nano plasmonic structures. High-quality 2D materials were prepared by mechanical exfoliation and dry transfer. Plasmonic nanostructures, designed via finite element method (FEM) to match emission wavelengths, significantly enhance photoluminescence through localized field confinement and the Purcell effect. Experimental results show pronounced emission enhancement across different TMDCs, confirming efficient exciton–plasmon coupling and the potential of this hybrid platform for next-generation optoelectronic devices.

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Manuscript ID.  0052
Paper No.  2025-Tue-P0401-P004
Che-Hao Liao Formation of non-polar and semi-polar AlN planes via microwave annealing of AlN on AAO templates

Chien-Sheng Huang, Basheer Baba, Yi-Tang Lin, He-Han Wu, Che-Hao Liao, Department of Electronic Engineering, National Yunlin University of Science and Technology; Xiao Tang, School of Electrical, Electronic and Mechanical Engineering, University of Bristol

This study explores the fabrication of non-polar and semi-polar AlN films using anodic aluminum oxide (AAO) on Si(100) substrates. A nanoporous AAO buffer layer is formed via anodization using oxalic acid, with pore size controlled by anodizing voltage and time. AlN films are then deposited by RF sputtering and microwave annealing. XRD analysis reveals that non-polar AlN(100) orientation dominates after annealing at 3000 W for 600 seconds, while semi-polar AlN(101) appears at lower annealing conditions. The highest domain sizes of 14.3 nm for non-polar AlN(100) and 28.8 nm for semi-polar AlN(101) are achieved, indicating tunable crystallinity via microwave annealing parameters.

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Manuscript ID.  0076
Paper No.  2025-Tue-P0401-P005
Che-Hao Liao Sensitivity Enhancement of Aluminum Nitride Surface Acoustic Wave Humidity Sensors Using Silica Nanospheres

Che-Hao Liao, Lu-Xiang Wang, I-Ten Chen, Shih-Hung Lin, Chien-Sheng Huang, Department of Electronic Engineering, National Yunlin University of Science and Technology

Surface acoustic wave (SAW) devices are extensively utilized in wireless communication and sensing due to their superior performance. This study develops an AlN-based SAW humidity sensor by depositing an AlN film on sapphire via MOCVD and patterning 10 μm interdigitated electrodes (IDEs) using photolithography. To enhance performance, silica nanospheres (SNs) with different ethanol diluted ratios were spin-coated at varying concentrations. The modified AlN SAW sensor, prepared by spin-coating silica nanospheres diluted in ethanol at a 1:1 ratio at 8000 rpm, exhibited a frequency shift of 830 kHz and a sensitivity of 10.4 kHz/%RH, representing a 2.44-fold improvement compared to the unmodified device.

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